High-coercivity Co/Pd multilayer films by heavy inert gas sputtering

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Abstract
Co/Pd multilayer thin films with enhanced coercivity have been prepared by sputter deposition in Kr or Xe instead of Ar. The roughly twofold increase in coercivity is thought to be due to suppression of energetic sputtering species by the heavier inert gases, resulting in reduced damage to the metastable Co/Pd interface. High coercivity is achieved at practical sputtering pressures, broadening the range of magneto-optical recording applications that can be addressed using the new class of Co/Pd and Co/Pt multilayer materials.