Deep X-ray lithography beamline at ELETTRA
- 1 July 2001
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
- Vol. 467-468, 1274-1278
- https://doi.org/10.1016/s0168-9002(01)00632-5
Abstract
No abstract availableThis publication has 3 references indexed in Scilit:
- Design of a beamline for soft and deep lithography on third generation synchrotron radiation sourceReview of Scientific Instruments, 1999
- Influence of secondary effects on the structure quality in deep X-ray lithographyNuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1995
- Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process)Microelectronic Engineering, 1986