Design of a beamline for soft and deep lithography on third generation synchrotron radiation source
- 1 March 1999
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 70 (3) , 1605-1613
- https://doi.org/10.1063/1.1149640
Abstract
No abstract availableKeywords
This publication has 17 references indexed in Scilit:
- Characterization of exposure and processing of thick PMMA for deep x-ray lithography using hard x-raysMicrosystem Technologies, 1998
- Free-standing ZnSe/ZnS quantum wires with high luminescence efficiencyApplied Physics Letters, 1997
- Fabrication of photonic crystals by deep x-ray lithographyApplied Physics Letters, 1997
- Replicating characteristics by SR lithographyPublished by SPIE-Intl Soc Optical Eng ,1995
- High-speed positive x-ray resist suitable for precise replication of sub-0.25-μm featuresJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- High-performance multilevel blazed x-ray microscopy Fresnel zone plates: Fabricated using x-ray lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Novel single mirror condenser for x-ray lithography beam linesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- SHADOW: A synchrotron radiation and X-ray optics simulation toolNuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 1994
- Synchrotron radiation beamline for x-ray lithographyJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Novel toroidal mirror enhances x-ray lithography beamline at the Center for X-ray LithographyPublished by SPIE-Intl Soc Optical Eng ,1991