Use of electron-beam irradiation to study performance degradation of bipolar transistors after reverse-bias stress
- 9 December 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- On the leverage of high f/sub T/ transistors for advanced high-speed bipolar circuitsPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Electron-beam damage of self-aligned silicon bipolar transistors and circuitsIEEE Transactions on Electron Devices, 1991
- High-performance bipolar technology for improved ECL power delayIEEE Electron Device Letters, 1991
- Junction degradation in bipolar transistors and the reliability imposed constraints to scaling and designIEEE Transactions on Electron Devices, 1988