Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold
- 19 August 2002
- journal article
- conference paper
- Published by AIP Publishing in Applied Physics Letters
- Vol. 81 (8) , 1483-1485
- https://doi.org/10.1063/1.1501763
Abstract
A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently.
Keywords
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