Photoacid and Photobase Generators: Prospects and Their Use in the Development of Polymeric Photosensitive Systems
- 1 November 1998
- journal article
- research article
- Published by Oxford University Press (OUP) in Bulletin of the Chemical Society of Japan
- Vol. 71 (11) , 2483-2507
- https://doi.org/10.1246/bcsj.71.2483
Abstract
This article describes the recent progress in the preparation of a set of compounds which can generate acids or bases upon irradiation of light. These compounds are called photoacid generators and photobase generators, respectively. Photoacid generators can be divided into two groups according to their characteristics; i.e., ionic- and non-ionic compounds. Photobase generators are fewer than photoacid generators. These compounds are widely used in the field of polymeric photosensitive systems such as photoinitiated polymerization, photoinduced crosslinking of polymers and oligomers, photoinduced degradation of polymers, and photoinduced transformation of functional groups in polymer chains. In particular, this article focuses on the applications of photoacid and photobase generators to promote the development of photoresist and UV curing materials.Keywords
This publication has 81 references indexed in Scilit:
- Photochemical Gel Formation by The Use of Polymers Bearing Both Photobase Generating Groups and Photoacid Generating Groups and Their Applications.Journal of Photopolymer Science and Technology, 1997
- Novel Hybrid-Type Photo-crosslinking Systems by Polymeric Photo-Base Generators and Quinoid Compounds.Journal of Photopolymer Science and Technology, 1996
- Highly efficient photocrosslinking by the use of pendant photo-acid generating groups.Journal of Photopolymer Science and Technology, 1995
- Polysiloxane formation at the irradiated polymer surface. A liquid-phase deposition method.Journal of Photopolymer Science and Technology, 1995
- Generation of polymer bases by the use of photochemical reaction of polymers bearing acyloxyimino groups and its application to UV curing systems.Journal of Photopolymer Science and Technology, 1994
- Chemically Amplified Resists. V Photochemical Proton Generation Mechanism from Triphenylsulfonium Salts.Journal of Photopolymer Science and Technology, 1994
- Positive Deep-UV Resist Based on Silylated Polyhydroxystyrene.Journal of Photopolymer Science and Technology, 1992
- Photochemical proton generation mechanism from onium salts.Journal of Photopolymer Science and Technology, 1990
- Photopolymerization of 1,2-epoxypropane and 1,2-epoxybutane by arenediazonium salts: evidence for anion dependence of the extent of polymerizationPolymer, 1980
- Photoinitiated cationic polymerization by dialkyl‐4‐hydroxyphenylsulfonium saltsJournal of Polymer Science: Polymer Chemistry Edition, 1980