Absolute measurement of normalized thickness, t/λi, from off-axis electron holography
- 1 March 1994
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 53 (3) , 283-289
- https://doi.org/10.1016/0304-3991(94)90040-x
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Elimination of thickness dependence from medium resolution electron hologramsUltramicroscopy, 1994
- Dislocation contrast in high-angle hollow-cone dark-field TEMUltramicroscopy, 1994
- Applications of electron holography to the study of interfacesUltramicroscopy, 1993
- Accurate measurements of mean inner potential of crystal wedges using digital electron hologramsUltramicroscopy, 1993
- Applications of electron holographyReviews of Modern Physics, 1987
- Electron holography approaching atomic resolutionUltramicroscopy, 1985
- Fresnelscher Interferenzversuch mit einem Biprisma f r ElektronenwellenThe Science of Nature, 1955