Elimination of thickness dependence from medium resolution electron holograms
- 31 March 1994
- journal article
- Published by Elsevier in Ultramicroscopy
- Vol. 53 (3) , 291-296
- https://doi.org/10.1016/0304-3991(94)90041-8
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Absolute measurement of normalized thickness, t/λi, from off-axis electron holographyUltramicroscopy, 1994
- Dislocation contrast in high-angle hollow-cone dark-field TEMUltramicroscopy, 1994
- Applications of electron holography to the study of interfacesUltramicroscopy, 1993
- Accurate measurements of mean inner potential of crystal wedges using digital electron hologramsUltramicroscopy, 1993
- Relativistic Hartree–Fock X-ray and electron scattering factorsActa Crystallographica Section A, 1968
- Microscopy by reconstructed wave-frontsProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1949