Metal ion implantation using a filtered cathodic vacuum arc

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Abstract
When plasma immersion ion implantation is performed in the condensable plasma stream produced by a cathodic vacuum arc, deposition as well as implantation usually occurs. In this article we describe a method of achieving pure implantation by orienting the substrate so that it is shadowed from the plasma beam. Implantation depth profiles measured in glassy carbon and CR39 polymer using Rutherford backscattering are compared to illustrate the effectiveness of the technique for conducting and insulating substrates. Charging of the insulating substrate was found to cause a reduction in implantation depth compared to a conducting substrate. The depth profiles in glassy carbon were comparable to those achieved by conventional extracted ion beam implantation. Implantation of magnesium into hydroxyapatite and alumina was carried out to improve the bone cell adhesion onto these materials for prosthetic applications.