Observation of short-range oxygen migration and oxygen exchange during low temperature plasma anodization of silicon through thin ZrO2 films
- 1 September 1982
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 95 (4) , 309-314
- https://doi.org/10.1016/0040-6090(82)90036-0
Abstract
No abstract availableKeywords
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