Formation of tantalum oxide by chemical vapor deposition
- 31 December 1974
- journal article
- Published by Elsevier in Journal of the Less Common Metals
- Vol. 38 (2-3) , 211-219
- https://doi.org/10.1016/0022-5088(74)90064-2
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Selected Properties of Pyrolytic Ta[sub 2]O[sub 5] FilmsJournal of the Electrochemical Society, 1973
- Reactively Sputtered Oxide FilmsJournal of the Electrochemical Society, 1969
- Texture of tungsten formed by deposition from the vapourJournal of Crystal Growth, 1968
- Structure des Oxides de TantaleJapanese Journal of Applied Physics, 1967
- Deposition of Tantalum and Tantalum Oxide by Superimposed RF and D -C SputteringJournal of the Electrochemical Society, 1967
- Investigation of Si-Ta2O5 System Prepared by Reactive SputteringJapanese Journal of Applied Physics, 1966
- Interrelation between the grain orientation and the radiation growth of uranium rodsAtomic Energy, 1965
- X. Quantitative measurement of preferred orientation in rolled uranium barsJournal of Computers in Education, 1952