Comparison of strain in glow discharge a-Si:F and a-Si:H
- 1 December 1985
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 77-78, 261-264
- https://doi.org/10.1016/0022-3093(85)90653-2
Abstract
No abstract availableThis publication has 6 references indexed in Scilit:
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- Determination of energy barrier for structural relaxation in a-Si and a-Ge by Raman scatteringJournal of Non-Crystalline Solids, 1984
- Raman scattering in hydrogenated amorphous silicon under high pressureSolid State Communications, 1982
- Vibrational properties of amorphous silicon alloysPhysical Review B, 1981
- Raman scattering properties of amorphous As and SbPhysical Review B, 1977
- Raman-Scattering Selection-Rule Breaking and the Density of States in Amorphous MaterialsPhysical Review Letters, 1970