Multilevel grating array illuminators manufactured by electron-beam lithography
- 1 March 1992
- journal article
- Published by Elsevier in Optics Communications
- Vol. 88 (1) , 37-41
- https://doi.org/10.1016/0030-4018(92)90305-b
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Array generation with multilevel phase gratingsJournal of the Optical Society of America A, 1990
- Multilevel phase holograms manufactured by electron-beam lithographyOptics Letters, 1990
- Module for optical logic circuits using symmetric self-electrooptic effect devicesApplied Optics, 1990
- A Dammann grating with diffraction orders of arbitrary intensity etched into Al2O3Optics Communications, 1990
- Beam Shaping with Optical Array GeneratorsJournal of Modern Optics, 1989
- Kinoform Phase Relief Synthesis: A Stochastic MethodOptical Engineering, 1989
- Iterative encoding of high-efficiency holograms for generation of spot arraysOptics Letters, 1989
- Partially illuminated kinoforms: a computer studyApplied Optics, 1987
- High-efficiency in-line multiple imaging by means of multiple phase hologramsOptics Communications, 1971