Multilevel phase holograms manufactured by electron-beam lithography

15 May 1990

journal article
Published by Optica Publishing Group in Optics Letters

Vol. 15 (10) , 568-569
https://doi.org/10.1364/ol.15.000568

Abstract

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to our knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to our knowledge, the highest reported to date.

Keywords

DIFFRACTION EFFICIENCY
FAR FIELD DIFFRACTION
LIGHT WAVELENGTH
OPTICAL DEVICES
PTYCHOGRAPHY
REFRACTIVE INDEX

This publication has 3 references indexed in Scilit:

Trends in lithography
IEEE Circuits and Devices Magazine, 1988
Electron Beam Fabrication Of Computer-Generated Holograms
Optical Engineering, 1985
Fabrication of micro lenses using electron-beam lithography
Optics Letters, 1981