Trends in lithography
- 1 September 1988
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Circuits and Devices Magazine
- Vol. 4 (5) , 11-17
- https://doi.org/10.1109/101.8119
Abstract
Current capabilities and advances in optical electron-beam, X-ray, and ion-beam lithography are discussed. Attention is restricted to the creation of the resist pattern. Equipment, resists, and processing are examined.Keywords
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