X-ray lithography
- 31 December 1986
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 5 (1-4) , 3-38
- https://doi.org/10.1016/0167-9317(86)90026-2
Abstract
No abstract availableKeywords
This publication has 18 references indexed in Scilit:
- Excimer laser projection lithography on a full-field scanning projection systemIEEE Electron Device Letters, 1986
- Reduction photolithography by ablation at wavelength 193 nmOptics Communications, 1986
- Submicron lithography and DUV-master masks made by ion projection lithographyMicroelectronic Engineering, 1985
- Submicron patterns formed by reactive ion etchingMicroelectronic Engineering, 1985
- X-ray lithography with synchrotron radiationZeitschrift für Physik B Condensed Matter, 1985
- X-Ray Lithography: Can It Be JustifiedPublished by SPIE-Intl Soc Optical Eng ,1985
- X‐Ray Investigation of Boron‐ and Germanium‐Doped Silicon Epitaxial LayersJournal of the Electrochemical Society, 1984
- Defect Repair Techniques For X-Ray MasksPublished by SPIE-Intl Soc Optical Eng ,1984
- Applications Of Focused Ion BeamsPublished by SPIE-Intl Soc Optical Eng ,1983
- One-step repair of transparent defects in hard-surface photolithographic masks via laser photodepositionIEEE Electron Device Letters, 1980