Nanopowder of silicon nitride produced in radio frequency modulated glow discharges from SiH4 and NH3
- 1 March 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 100-101, 55-58
- https://doi.org/10.1016/s0257-8972(97)00587-2
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Silicon carbide nanoparticles for advanced materials produced in radio frequency modulated glow dischargesVacuum, 1997
- Particle agglomeration study in rf silane plasmas: In situ study by polarization-sensitive laser light scatteringJournal of Applied Physics, 1996
- Production of boron nitride nanometric powder by plasma-enhanced chemical vapor deposition: microstructural characterizationDiamond and Related Materials, 1996
- Experimental evidence for nanoparticle deposition in continuous argon–silane plasmas: Effects of silicon nanoparticles on film propertiesJournal of Vacuum Science & Technology A, 1996
- Production of nanometric particles in radio frequency glow discharges in mixtures of silane and methaneJournal of Vacuum Science & Technology A, 1996
- Synthesis of silicon nitride particles in pulsed radio frequency plasmasJournal of Vacuum Science & Technology A, 1996
- Effects of plasma processing on the microstructural properties of silicon powdersPlasma Sources Science and Technology, 1994
- Nanocrystalline high melting point compound-based materialsJournal of Materials Science, 1994
- Unusual photoluminescence properties in amorphous silicon nanopowder produced by plasma enhanced chemical vapor depositionApplied Physics Letters, 1994
- Negative ion mass spectra and particulate formation in radio frequency silane plasma deposition experimentsApplied Physics Letters, 1993