Effects of plasma processing on the microstructural properties of silicon powders

Publisher Website
Google Scholar
Abstract
The effects of plasma processing conditions on the microstructural properties of silicon powders are presented. Hydrogenated nanophase silicon powders were prepared using low-pressure and low-temperature square wave modulated RF plasma (13.56 MHz) using pure silane gas. Plasma parameters such as pressure, RF power, plasma modulation frequency, and gas flow rate were varied. In situ analysis by quadrupolar mass spectroscopy and ex situ analysis of the silicon powders by Fourier transform infrared spectroscopy (FTIR) and thermal desorption spectrometry of hydrogen were performed. The thermal desorption spectrometry results show the fundamental differences between the concentrations of hydrogen weakly and strongly bonded in silicon powders as compared to amorphous silicon films. The FTIR analysis also determined the microstructural characteristics of powders and hence their volume/surface ratio. This parameter was determined from the balance of Pj probabilities of having one of the Hj-Si-Si4-j bond arrangements in the powder particles. These results reveal an increase in hydrogen content and a reduction in volume/surface ratio as the modulation frequency of RF power increases. In consequence, higher compactness of silicon powders is associated with long particle residence times inside the plasma as a result of ion bombardment. TEM analysis indicated a considerable dispersion of particle size and some degree of structure of the silicon powder characterized by intergrain linkage. We point out the dominant presence of hydrogen on the particle surfaces (external voids), which may cause the high reactivity of grains, increasing the degree of intergrain linkage.