Observation of growing kinetics of particles in a helium-diluted silane rf plasma
- 28 September 1992
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 61 (13) , 1510-1512
- https://doi.org/10.1063/1.107532
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Transport of dust particles in glow-discharge plasmasPhysical Review Letters, 1992
- Measurements of particle size kinetics from nanometer to micrometer scale in a low-pressure argon-silane radio-frequency dischargeApplied Physics Letters, 1992
- Particle generation and behavior in a silane-argon low-pressure discharge under continuous or pulsed radio-frequency excitationJournal of Applied Physics, 1991
- Monte Carlo-fluid hybrid model of the accumulation of dust particles at sheath edges in radio-frequency dischargesApplied Physics Letters, 1991
- In Situ Observation of Particle Behavior in rf Silane PlasmasJapanese Journal of Applied Physics, 1991
- Powder-free plasma chemical vapor deposition of hydrogenated amorphous silicon with high rf power density using modulated rf dischargeApplied Physics Letters, 1990
- Particulates in aluminum sputtering dischargesJournal of Applied Physics, 1990
- In situ plasma contamination measurements by HeNe laser light scattering: A case studyJournal of Vacuum Science & Technology A, 1990
- Effects of low-frequency modulation on rf discharge chemical vapor depositionApplied Physics Letters, 1988
- A model for the discharge kinetics and plasma chemistry during plasma enhanced chemical vapor deposition of amorphous siliconJournal of Applied Physics, 1988