Generation of large area condenser zone plates with smallest zone width below 40 nm by electron beam lithography
- 31 March 1998
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 41-42, 465-468
- https://doi.org/10.1016/s0167-9317(98)00108-7
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Nanostructuring high resolution phase zone plates in nickel and germanium using cross-linked polymersMicroelectronic Engineering, 1996
- Cross-linked polymers for nanofabrication of high-resolution zone plates in nickel and germaniumJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995