Characterization of low pressure chemically vapour- deposited thin silicon nitride films
- 1 December 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 122 (2) , 153-163
- https://doi.org/10.1016/0040-6090(84)90005-1
Abstract
No abstract availableThis publication has 14 references indexed in Scilit:
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