Properties of CeO2 thin films deposited on Si(100) and Si(111) substrates by radio frequency-magnetron sputtering
- 1 May 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (3) , 1098-1101
- https://doi.org/10.1116/1.590015
Abstract
No abstract availableKeywords
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