Electromigration-induced drift in damascene and plasma-etched Al(Cu). II. Mass transport mechanisms in bamboo interconnects
- 1 January 2000
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 87 (1) , 99-109
- https://doi.org/10.1063/1.372389
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
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