Fabrication Of Circular Gratings On Lnp By E-beam Lithography And Reactive Ion Etching

Publisher Website

24 August 2005

proceedings article
Published by Institute of Electrical and Electronics Engineers (IEEE)

p. 14-15
https://doi.org/10.1109/leosst.1991.638990

Abstract

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Keywords

This publication has 1 reference indexed in Scilit:

Fabrication of GaAs Ultrafine Gratings by Single-Layer-Masked SiCl₄ Reactive Ion Etching
Japanese Journal of Applied Physics, 1990