Reactive magnetron sputtering of Al doped ZnO films: dependence of optical, electrical, compositional and structural properties on deposition conditions
- 1 June 1993
- journal article
- research article
- Published by Elsevier in Applied Surface Science
- Vol. 70-71, 707-711
- https://doi.org/10.1016/0169-4332(93)90606-c
Abstract
No abstract availableKeywords
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