A Curvature in the In D versus 1/T Plot for Self‐Diffusion in Nickel at Temperatures from 980 to 1400°C
- 1 January 1968
- journal article
- research article
- Published by Wiley in Physica Status Solidi (b)
- Vol. 28 (2) , 569-576
- https://doi.org/10.1002/pssb.19680280214
Abstract
A rather gradual curvature was found for the In D versus 1/T plot for tracer‐self‐diffusion in nickel single crystals at temperatures from 980 to 1400 °C. The activation energies and frequency factors at the highest and lowest temperatures were in agreement with values measured by other investigators in a similar temperature region. It proved to be possible to analyse the curve in terms of contributions of single and multiple vacancies. Especially accurate values of the characteristic quantities for the diffusion via single vacancies were obtained. Other possible explanations of the curvature were investigated, but rejected.Keywords
This publication has 9 references indexed in Scilit:
- On the analysis of nonlinear Arrhenius plots of self-diffusion coefficients for f.c.c. metalsMaterials Science and Engineering, 1967
- On the Inherent Curvature of the Arrhenius Plot in Diffusion ExperimentsPhysica Status Solidi (b), 1967
- Änderung der Eindringkurven bei Diffusionsmessungen durch Verdampfung des DiffusionsmaterialsPhysica Status Solidi (b), 1967
- Self-Diffusion along Edge Dislocations in NickelPhysical Review B, 1966
- Analysis of Enhanced Diffusivity in NickelJournal of Applied Physics, 1965
- The Contribution of Multiple Vacancies to Self‐DiffusionPhysica Status Solidi (b), 1965
- SELF-DIFFUSION IN POLYCRYSTALLINE NICKELCanadian Journal of Chemistry, 1959
- On the role of dislocations in bulk diffusionActa Metallurgica, 1957
- Note on Self-Diffusion of NickelJournal of Applied Physics, 1955