Fabrication of sub-10-nm Au–Pd structures using 30 keV electron beam lithography and lift-off
- 10 December 2002
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 65 (3) , 327-333
- https://doi.org/10.1016/s0167-9317(02)00963-2
Abstract
No abstract availableKeywords
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