Fabrication of high-density nanostructures by electron beam lithography
- 1 November 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 16 (6) , 3887-3890
- https://doi.org/10.1116/1.590428
Abstract
No abstract availableKeywords
This publication has 9 references indexed in Scilit:
- Fabrication and physics of 2 nm islands for single electron devicesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Sputter cleaning and smoothening of GaAs(001) using glancing-angle ion bombardmentApplied Physics Letters, 1995
- Physical and magnetic properties of submicron lithographically patterned magnetic islandsJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1995
- Fabrication of sub-10 nm structures by lift-off and by etching after electron-beam exposure of poly(methylmethacrylate) resist on solid substratesJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1993
- Ion etching of ultranarrow structuresPublished by SPIE-Intl Soc Optical Eng ,1990
- Microfabrication below 10 nmApplied Physics Letters, 1990
- Enhanced sensitivity in the electron beam resist poly(methyl methacrylate) using improved solvent developerPolymer, 1988
- Fabrication of ultrahigh resolution structures in compound semiconductor heterostructuresJournal of Vacuum Science & Technology B, 1987
- Fabrication of small laterally patterned multiple quantum wellsApplied Physics Letters, 1986