Ionic Polishing of Optical Surfaces
- 1 June 1966
- journal article
- Published by Optica Publishing Group in Applied Optics
- Vol. 5 (6) , 1031-1034
- https://doi.org/10.1364/ao.5.001031
Abstract
The controlled removal of material from the surface of insulators has been observed by using a positive ion beam. In the energy range 0.5–2.0 MeV the sputtering yield was observed to be unity. The application of this technique to the manufacture of high quality optical surfaces is discussed.Keywords
This publication has 12 references indexed in Scilit:
- Controlled Figuring of Optical Surfaces by Energetic Ionic BeamsApplied Optics, 1965
- Sputtering Studies of Insulators by Means of Langmuir ProbesJournal of Applied Physics, 1965
- Radiation-Induced Stress Relaxation in Quartz and Vitreous SilicaJournal of Applied Physics, 1964
- Sputtering of Vitreous Silica by 20- to 60-kev Xe+ IonsJournal of Applied Physics, 1961
- Radiation Effects of Bombardment of Quartz and Vitreous Silica by 7.5-kev to 59-kev Positive IonsPhysical Review B, 1960
- Fast-Neutron-Induced Changes in Quartz and Vitreous SilicaPhysical Review B, 1958
- Ionic Bombardment Cleaning of GlassNature, 1958
- Radiation Effect of Positive Ion Bombardment on GlassJournal of Applied Physics, 1957
- Sputtering by Ion BombardmentPublished by Elsevier ,1955
- Reduction of Optical Reflectivity of Glass Surfaces Resulting from Ion BombardmentNature, 1949