Sputtering of Vitreous Silica by 20- to 60-kev Xe+ Ions

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Abstract
Experimental values for the sputtering of quartz by xenon positive ions at flux densities of 2×1015 ions/cm2 sec in a vacuum of 10−5 mm Hg are found by measuring the volume of the sputtered cavity by means of interference fringe contours. The sputtering ratios are 0.706±0.061 at 20 kev, 0.85±0.13 at 30 kev, 1.78±0.13 at 40 kev, 1.74±0.12 at 50 kev, and 1.31±0.09 at 60 kev. The technique of volume measurement by interference fringe contours has an accuracy of ±2×10−8 cc and is estimated to have an ultimate accuracy of ±10−10 cc.

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