Sputtering of Silver by Hydrogen Ions

Abstract
The sputtering of silver by the ions H+, H2+, and D+ has been measured by allowing a magnetically analyzed beam of ions from an RF source to strike a target containing radioactive silver. The angular distribution of the sputtered silver follows approximately a cosine law. At normal incidence and 9250 volts energy, the number of atoms sputtered per incident ion is 0.03 for H+, 0.075 for H2+, and 0.08 for D+. These values are much lower than those of previous workers, and the difference is ascribed to the absence of atoms and excited molecules from the analyzed ion beams.
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