Controlled Sputtering of Metals by Low-Energy Hg Ions
- 1 May 1956
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 102 (3) , 690-704
- https://doi.org/10.1103/physrev.102.690
Abstract
Sputtering has been studied under well controlled conditions, i.e., low gas pressure (1 micron), defined energy (up to 300 ev) and angle of incidence of the bombarding ions, and high ion-current density (10 ma/), by immersing the target in a low-pressure Hg plasma of high density created in a pool-type vacuum arc.
Keywords
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