Surface Cleaning by Cathode Sputtering
- 1 September 1960
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 31 (9) , 1583-1584
- https://doi.org/10.1063/1.1735896
Abstract
Evidence is presented to indicate that surface recontamination from background gases may be a significant factor in quantitative sputtering measurements, even for beam current densities of 0.1 ma/cm2 and operating pressures of 5×10−5 mm of Hg. An oversimplified mechanism is discussed which leads to criteria for a cleansurface sputtering experiment.This publication has 4 references indexed in Scilit:
- Sputtering Thresholds and Displacement EnergiesPhysical Review Letters, 1960
- Production and Demonstration of Atomically Clean Metal SurfacesJournal of Applied Physics, 1960
- High-Energy SputteringJournal of Applied Physics, 1960
- Sputtering Yields for Normally Incident-Ion Bombardment at Low Ion EnergyPhysical Review B, 1957