Non hydrogenated materials for x-ray masks (Si3N4 and SiC)
- 31 December 1987
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 6 (1-4) , 241-245
- https://doi.org/10.1016/0167-9317(87)90044-x
Abstract
No abstract availableKeywords
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