Semi-insulating properties of Fe-implanted InP. II. Deep levels of Fe from the study of p+-semi-insulating-n+ diodes
- 1 September 1985
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 58 (5) , 1787-1797
- https://doi.org/10.1063/1.336029
Abstract
The properties of semi-insulating (SI) Fe-implanted InP are studied via the electrical and optical properties of p+-SI-n+ InP diodes. The current-voltage-temperature characteristics reveal a rich variety of transport processes in which the deep levels of Fe play a prominent role, including tunneling and field-assisted thermionic emission from these levels, and space-charge-limited double-injection current effects. From the analysis of these currents, different experimental estimates of the position of the deep levels have been obtained. These are compared with a direct experimental determination of their position from the measurement of the photocurrent spectra of the p+-SI-n+ diodes. These results establish the position of the iron acceptors at a level lying between 0.60–0.65 eV below the conduction band minimum. Capacitance spectroscopy of the p+-SI-n+ diodes revealed additional defect levels and carrier freeze-out effects at low temperatures.This publication has 15 references indexed in Scilit:
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