An AES-SIMS study of silicon oxidation induced by ion or electron bombardment

This publication has 54 references indexed in Scilit:

• Comparison of xenon retention in ion implanted silicon dioxide and oxygen-doped silicon
  Nuclear Instruments and Methods, 1978
• The use of secondary ion mass spectrometry for studies of oxygen adsorption and oxidation
  Surface Science, 1977
• Recoil implantation from a thin source: I. Underlying theory and numerical results
  Surface Science, 1976
• Pre-equilibrium variation of the secondary ion yield
  International Journal of Mass Spectrometry and Ion Physics, 1975
• The mechanism of simultaneous implantation and sputtering by high energy oxygen ions during secondary ion mass spectrometry (SIMS) analysis
  Surface Science, 1974
• Primary oxygen ion implantation effects on depth profiles by secondary ion emission mass spectrometry
  Applied Physics Letters, 1973
• Transmission sputtering and recoil implantation from thin metal films under ion bombardment
  Nuclear Instruments and Methods, 1972
• Progress in analytic methods for the ion microprobe mass analyzer
  International Journal of Mass Spectrometry and Ion Physics, 1969
• The theory of recoil implantation
  Radiation Effects, 1969
• Notizen: Die positive Sekundärionenemission von sauerstoffbedeckten Metallen
  Zeitschrift für Naturforschung A, 1967