Ionic species responsible for the plasma anodization of silicon
- 4 July 1988
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 53 (1) , 57-59
- https://doi.org/10.1063/1.100571
Abstract
Identification of the species that promotes the growth of silicon dioxide on silicon in a microwave oxygen plasma has been investigated. Comparison of ion analysis experiments using quadropole mass spectrometry and oxide growth experiments performed in the same system indicates a strong correlation between the oxide growth and the presence of O− ions in the plasma.Keywords
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