Optimisation of Deposition Parameters for Desired Mechanical and Frictional Properties of Reactively Sputtered TinX Films
- 1 January 1988
- journal article
- Published by SAGE Publications in Surface Engineering
- Vol. 4 (4) , 309-315
- https://doi.org/10.1179/sur.1988.4.4.309
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
- Effects of Deposition Parameters on Structure and Composition of Reactively Sputtered TiNx FilmsSurface Engineering, 1987
- A simple method for monitoring surface temperatures in plasma treatmentsJournal of Vacuum Science & Technology A, 1986
- Structure and properties of TiN coatingsThin Solid Films, 1985
- Problems in the physical vapour deposition of titanium nitrideThin Solid Films, 1985
- High rate reactively sputtered TiN coatings on high speed steel drillsThin Solid Films, 1985
- Initial growth of TiN on different phases of high speed steelThin Solid Films, 1985
- The stress in ion-plated HfN and TiN coatingsThin Solid Films, 1985
- Mechanical-contact-induced transformation from the amorphous to the partially crystalline state in metallic glassThin Solid Films, 1984
- Very high rate reactive sputtering of TiN, ZrN and HfNThin Solid Films, 1983
- Lattice parameter of the non-stoichiometric compound TiNxJournal of Applied Crystallography, 1975