Novel Plasma Control Method in PECVD for Preparing Microcrystalline Silicon
- 1 January 1997
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
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- Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasmaJournal of Non-Crystalline Solids, 1996
- Control of nucleation and growth in the preparation of crystals by plasma-enhanced chemical vapour depositionPhilosophical Magazine Part B, 1991
- Preparation of a-Si:H Films by VHF Plasma CVDMRS Proceedings, 1988
- Wide-Rrange Control of Crystallite Size and Its Orientation in Glow-Discharge Deposited µc-Si:HJapanese Journal of Applied Physics, 1983