Deposition of nanocrystalline silicon films (nc-Si:H) from a pure ECWR-SiH4 plasma
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 895-898
- https://doi.org/10.1016/0022-3093(96)00078-6
Abstract
No abstract availableKeywords
Funding Information
- Bundesministerium für Bildung und Forschung
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- Detailed Study of Si-H Stretching Modes in µc-Si: H Film through Second Derivative IR SpectraJapanese Journal of Applied Physics, 1985
- Electron cyclotron wave resonances and power absorption effects in electrodeless low pressure h.f. plasmas with a superimposed static magnetic fieldPlasma Physics, 1974