Ion energy measurement at the powered electrode in an rf discharge
- 15 March 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 63 (6) , 1894-1898
- https://doi.org/10.1063/1.339888
Abstract
Ion energy measurements have been performed with an electrostatic parallel plate energy analyzer at the powered electrode of a 13.56–MHz rf discharge. Considerable splitting of the ion energy distributions is observed due to rf oscillations. Plasma potential, sheath thickness, and total ion current are derived from the observed energy profiles. Low-pressure operation of the plasma at several mTorr permits a collisionless sheath approximation and gives rise to well-defined energy spectra.This publication has 7 references indexed in Scilit:
- A magnetic multipole reactor for high-flux reactive-ion etchingJournal of Applied Physics, 1988
- Ion bombardment energy distributions in radio-frequency glow-discharge systemsJournal of Applied Physics, 1986
- Time-resolved optical diagnostics of radio frequency plasmasJournal of Vacuum Science & Technology A, 1985
- Review: dry etching of silicon oxideVacuum, 1984
- The design of plasma etchantsPlasma Chemistry and Plasma Processing, 1981
- Positive-ion bombardment of substrates in rf diode glow discharge sputteringJournal of Applied Physics, 1972
- Energy Dispersion of Positive Ions Effused from an RF PlasmaJournal of the Physics Society Japan, 1970