Oxygen implanter for simox
- 1 January 1985
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 6 (1-2) , 63-69
- https://doi.org/10.1016/0168-583x(85)90611-1
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- C.M.O.S. devices fabricated on buried SiO 2 layers formed by oxygen implantation into siliconElectronics Letters, 1978
- Formation of SiO2 Films by Oxygen-Ion BombardmentJapanese Journal of Applied Physics, 1966