Boundary Conditions for Models of Ion and Excited-State Formation in the Sputtering Process
- 1 January 1981
- book chapter
- Published by Springer Nature
Abstract
No abstract availableKeywords
This publication has 65 references indexed in Scilit:
- On the kinetic energies of sputtered excited particles: II. Theory and applications to group IIA fluoridesSurface Science, 1980
- Velocity measurements of sputtered atoms in excited statesNuclear Instruments and Methods, 1980
- Aspects of quantitative secondary ion mass spectrometryNuclear Instruments and Methods, 1980
- On the kinetic energies of sputtered excited particles, I. Atoms sputtered from Li, LiF, and NaClRadiation Effects, 1980
- Experimental and theoretical approaches to the ionization process in secondary-ion emissionSurface Science, 1979
- Comparative SNMS and SIMS studies of oxidized Ce and GdSurface Science, 1979
- Absolute photon yields in the sputter-induced optical emission processApplied Physics Letters, 1978
- Significance of negative ion formation in sputtering and SIMS analysisJournal of Vacuum Science and Technology, 1978
- secondary ion production due to ion-surface bombardmentPublished by Elsevier ,1977
- The influence of single crystal structure on photon and secondary ion emission from Ar+ion bombarded aluminiumRadiation Effects, 1977