Kinetics of Changes in N f and D it at the Si ‐ SiO2 Interface under Long‐Term Positive as well as Negative Bias‐Temperature Aging
- 1 January 1983
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 130 (1) , 138-143
- https://doi.org/10.1149/1.2119641