Reactive high rate d.c. sputtering of oxides
- 1 September 1984
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 119 (2) , 203-209
- https://doi.org/10.1016/0040-6090(84)90535-2
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Reactive high rate sputtering of oxidesThin Solid Films, 1981
- Optical layers produced by sputteringThin Solid Films, 1981
- High rate deposition of transparent conducting films by modified reactive planar magnetron sputtering of Cd2Sn alloyJournal of Vacuum Science and Technology, 1981
- Discharge characteristics for magnetron sputtering of Al in Ar and Ar/O2 mixturesJournal of Vacuum Science and Technology, 1980
- Sputtering of Dielectrics by High-Frequency FieldsJournal of Applied Physics, 1962