Nonlocal transport models of the self-consistent potential distribution in a plasma sheath with charge transfer collisions
- 1 December 1988
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 64 (11) , 6200-6209
- https://doi.org/10.1063/1.342077
Abstract
Plasma sheaths are often assumed to be collision free; however, high-voltage cathode sheaths are typically thicker than the mean free path for charge transfer collisions at pressures encountered in glow discharge processing equipment (greater than 10 mTorr). In this paper, the potential distribution in a plasma sheath is determined by solving Poisson’s equation self-consistently using a kinetic theory nonlocal ion transport model for charge transfer collisions. The relationship between the potential distribution, ion flux, and thickness of a plasma sheath is presented for arbitrary values of the sheath thickness relative to the mean free path for charge transfer. The results may be used to estimate the ion flux from measurements of the sheath thickness and potential drop across the sheath. Ion energy distribution functions and a one-parameter approximation to the numerically determined potential distribution are also presented. These results apply to rf discharges in a time-averaged sense when the ion sheath transit time is much longer than the rf cycle time, and they apply to high-voltage cathode sheaths in ‘‘abnormal’’ dc and low-frequency rf discharges. The present model is compared to earlier self-consistent sheath models, including the collision-free approximation, the local mobility model, and a nonlocal fluid approximation known as the viscous drag model.This publication has 17 references indexed in Scilit:
- Sheath collision processes controlling the energy and directionality of surface bombardment in O2 reactive ion etchingJournal of Applied Physics, 1988
- A Time‐Average Model of the RF Plasma SheathJournal of the Electrochemical Society, 1988
- Continuum modeling of argon radio frequency glow dischargesApplied Physics Letters, 1987
- Kinetic theory of the plasma sheath transition in a weakly ionized plasmaPhysics of Fluids, 1981
- Etching of SiO2 and Si in a He-F2 plasmaJournal of Applied Physics, 1980
- Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etchingJournal of Applied Physics, 1979
- Influence of Scattering and Ionization on RF Impedance in Glow Discharge SheathsIBM Journal of Research and Development, 1979
- Exact Solution of the Collisionless Plasma-Sheath EquationPhysics of Fluids, 1963
- Interpretation of Field Measurements in the Cathode Region of Glow DischargesPhysical Review B, 1955
- A General Theory of the Plasma of an ArcPhysical Review B, 1929