An electron microscopy study of arsenic segregation in silicon
- 31 July 1977
- journal article
- Published by Elsevier in Acta Metallurgica
- Vol. 25 (7) , 809-814
- https://doi.org/10.1016/0001-6160(77)90097-9
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Arsenic Clustering in SiliconJournal of Applied Physics, 1971
- Neutron irradiation damage in molybdenumPhilosophical Magazine, 1971
- A STUDY OF DIFFUSED LAYERS OF ARSENIC AND ANTIMONY IN SILICON USING THE ION-SCATTERING TECHNIQUEApplied Physics Letters, 1970
- Silicon Defect Structure Induced by Arsenic Diffusion and Subsequent Steam OxidationIBM Journal of Research and Development, 1970
- Partial dislocations associated with NbC precipitation in austenitic stainless steelsPhilosophical Magazine, 1964
- Clusters of point defects in irradiated metalsDiscussions of the Faraday Society, 1961