Thin boron doped microcrystalline silicon films
- 31 July 1993
- journal article
- Published by Elsevier in Solar Energy Materials and Solar Cells
- Vol. 30 (2) , 139-145
- https://doi.org/10.1016/0927-0248(93)90015-u
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Highly conductive ultrathin crystalline Si layers by thermal crystallization of amorphous SiApplied Physics Letters, 1991
- Enhancement of open circuit voltage in high efficiency amorphous silicon alloy solar cellsApplied Physics Letters, 1986
- The effects of microcrystal size and shape on the one phonon Raman spectra of crystalline semiconductorsSolid State Communications, 1986
- Substrate temperature dependence of microcrystallinity in plasma-deposited, boron-doped hydrogenated silicon alloysApplied Physics Letters, 1983
- A thermodynamic criterion of the crystalline-to-amorphous transition in siliconPhilosophical Magazine Part B, 1982
- Electrical and Structural Properties of Phosphorous-Doped Glow-Discharge Si:F:H and Si:H FilmsJapanese Journal of Applied Physics, 1980