Sputtering of amorphous silicon films by 0.5 to 5 keV Ar+ ions
- 30 September 1979
- journal article
- Published by Elsevier in Applications of Surface Science
- Vol. 3 (2) , 251-271
- https://doi.org/10.1016/0378-5963(79)90024-2
Abstract
No abstract availableThis publication has 54 references indexed in Scilit:
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