Application of run by run controller to the chemical-mechanical planarization process. II
- 17 December 2002
- proceedings article
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- p. 371-378
- https://doi.org/10.1109/iemt.1994.404736
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Run-by-run process control: performance benchmarksPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2003
- Application of Run by Run controller to the chemical-mechanical planarization process. IPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Concurrent deployment of run by run controller using SCC frameworkPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Characterization of mechanical planarization processesPublished by Institute of Electrical and Electronics Engineers (IEEE) ,2002
- Run by run process control: combining SPC and feedback controlIEEE Transactions on Semiconductor Manufacturing, 1995